Ion implantation:Basic to device fabrication Emanuele Rimini
Material type:
TextLanguage: English Publication details: Boston KAP 1995 Description: 393pISBN: 9780792395201Subject(s): ION BEAM INDUCED | ION SOURCES | P-N JUNCTION AND DIODE | WAFER COOLINGDDC classification: 537.5
| Item type | Current library | Call number | Status | Date due | Barcode |
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Book
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NISER LIBRARY | 537.5 RIM-I (Browse shelf(Opens below)) | Available | 7972 | |
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Book
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NISER LIBRARY | 537.5 RIM-I (Browse shelf(Opens below)) | Available | 7973 |
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| 537.311.322 TUR-Q Quantum dot(the): a journey into the future of microelectronics | 537.311 HOL-S Sem microcharacterization of semiconductors | 537.5 RID-E Electrons and phonos in semiconductor multilayers | 537.5 RIM-I Ion implantation:Basic to device fabrication | 537.5 RIM-I Ion implantation:Basic to device fabrication | 537.5 SHI-Q Quantum wells: physics and electronics of two-dimensional systems | 537.5 SHI-Q Quantum wells: physics and electronics of two-dimensional systems |
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