| 000 | 00539nam a2200205Ia 4500 | ||
|---|---|---|---|
| 008 | 140908s9999 xx 000 0 und d | ||
| 020 | _a9780792395201 | ||
| 040 | _aNISER LIBRARY | ||
| 041 | _aEnglish | ||
| 082 |
_a537.5 _bRIM-I |
||
| 100 | _aRimini, Emanuele | ||
| 245 |
_aIon implantation:Basic to device fabrication _cEmanuele Rimini |
||
| 260 |
_aBoston _bKAP _c1995 |
||
| 300 | _a393p. | ||
| 650 | _aION BEAM INDUCED | ||
| 650 | _aION SOURCES | ||
| 650 | _aP-N JUNCTION AND DIODE | ||
| 650 | _aWAFER COOLING | ||
| 942 | _cBK | ||
| 999 |
_c8203 _d8203 |
||