000 | 00560nam a2200205Ia 4500 | ||
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008 | 140908s9999 xx 000 0 und d | ||
020 | _a9483540642138 | ||
040 | _aNISER LIBRARY | ||
041 | _aEnglish | ||
082 |
_a621.382 _bGRA-M |
||
100 | _aGraff, K | ||
245 |
_aMetal impurities in silicon device fabrication _cKlaus Graff |
||
250 | _a2nd rev. ed. | ||
260 |
_aBerlin _bSpringer _c2000 |
||
300 | _axv,268p. | ||
440 | _aSringer series in materials science | ||
500 | _aRef sec. | ||
650 | _aSILICON DEVICES-METAL IMPURITIES | ||
942 | _cBK | ||
999 |
_c7377 _d7377 |