000 00893nmm a2200277Ia 4500
008 140908s9999 xx 000 0 und d
020 _a9783540766643, 978-3-540-76664-3
040 _aNISER LIBRARY
041 _aEnglish
082 _a620.44,
_b23
245 _aReactive Sputter Deposition
260 _aBerlin, Heidelberg
_bSpringer Berlin Heidelberg
_c2008.
500 _aChemistry and Materials Science (Springer-11644)
650 _aChemistry, Physical organic
650 _aSurfaces and Interfaces, Thin Films
650 _aChemical engineering
650 _aChemistry
650 _aChemistry
650 _aCondensed Matter Physics
650 _aIndustrial Chemistry/Chemical Engineering
650 _aPhysical Chemistry
650 _aSurfaces (Physics)
700 _aDepla, Diederik., editor.
856 _uhttp://dx.doi.org/10.1007/978-3-540-76664-3
942 _cEB
999 _c19964
_d19964